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Peer-Reviewed Publication
Nano Lett2026;26(34):11452-11458.September 2, 2026Journal Article

Highly Efficient Postprocessing Cleaning of van der Waals Devices.

Zhaokuan Yu1, Yuqing He2, Juntai Wu2,3, Xin Lu4, Quanshui Zheng1,2,5, Ming Ma2,3,5
1Center for Double-Helix, Tsinghua Shenzhen International Graduate School, Shenzhen518055, China.
2Center for Nano and Micro Mechanics, Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing100084, China.
3State Key Laboratory of Tribology in Advanced Equipment (SKLT) & Department of Mechanical Engineering, Tsinghua University, Beijing100084, China.
4Department of Physics, Zhejiang University, Hangzhou310027, China.
5Institute of Superlubricity Technology, Research Institute of Tsinghua University in Shenzhen, Shenzhen518057, China.
PubMed DOI

Abstract

Interfacial contaminants remain a major technical challenge for van der Waals (vdW) junctions, severely degrading device performance. Given the inherent difficulty of fabricating contaminant-free vdW interfaces, developing effective postfabrication cleaning technologies is crucial for restoring interfacial quality. Existing technologies include annealing, which results in incomplete removal, and A…

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