Inkjet-Printed SiOxNy Barrier Film for Encapsulation of Perovskite Solar Cells.

Bohan Li^1,2, Jian Qin^1,3, Jiajun Hong^1,4, Yinzhi Gong^1,3, Lifeng Sang^1,3, Ke Shui^1,3, Tianyu Xu^1,3, Xingze Chen^1,3, Junhe Zhu^1,3, Changzeng Ding¹, Shuangli Yang⁵, Zongbo Zhang⁶, Qun Luo¹, Chang-Qi Ma¹

¹i-Lab & Printable Electronics Research Center, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou, People's Republic of China.

²Nano Science and Technology Institute, University of Science and Technology of China, Suzhou, People's Republic of China.

³School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, People's Republic of China.

⁴School of CHIPS, XJTLU Entrepreneur College (Taicang), Xi'an Jiaotong-Liverpool University, Suzhou, People's Republic of China.

⁵Vacuum Interconnected Nanotech Workstation (Nano-X), Suzhou Institute of Nano-Tec and Nano-Bionics, Chinese Academy of Sciences, Suzhou, People's Republic of China.

⁶Key Laboratory of Science and Technology on High-tech Polymer Materials, Institute of Chemistry, Chinese Academy of Sciences, Beijing, People's Republic of China.

PubMed DOI

Abstract

Thin-film encapsulation is a suitable method for enhancing the environmental stability of perovskite solar cells (PSCs) against oxygen and moisture. In this work, inkjet printing of perhydropolysilazane (PHPS) solution was first adopted to fabricate silicon oxynitride (SiOxNy) barrier films, which were converted from PHPS via vacuum ultraviolet (VUV) treatment. The transformation process was confi…

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